Hexamethyldisilane C6H18Si2 CAS 1450-14-2  

    Hexamethyldisilane acts as a silylating reagent for allylic acetates, aryl halides and diketones. It is a source material for vapor deposition during silicon carbide growth. It is also used in electronic and semiconducter industries.  Application: Hexamethyldisilane is an important silane protective agent, which can synthesize sodium trimethylsilane, potassium trimethylsilane and lithium trimethylsilane. Preparation of iodotrimethylsilane. Used as trimethylsilane anion reagent. silylating or reducing reagent in combination with a Pd catalyst or a nucleophile. Replaces aromatic nitriles with TMS groups in presence of [RhCl(cod)]2. Precursor for CVD of silicon carbide. Brings about the homocoupling of arenesulfonyl chlorides in the presence of Pd2(dba)3. Used as a solvent for the direct borylation of fluoroaromatics. Reacts with alkynes to form siloles. Undergoes the silylation of acid chlorides to give acylsilanes.  Product Name: Hexamethyldisilane&nbs…